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[Data] Semiconductor Batch Spray Cleaning

The batch spray system is an extremely efficient system that has low chemical consumption, requires minimal space, and enables various processes!

This document is a technical explanation regarding "BATCHSPRAY." Since it is specialized in wafer processing, it enables appropriate processes in various situations. It is noted that when considering the reactivity of the substrate surface, it is important to take into account the presence of the boundary layer. 【Contents】 ■ Introduction ■ Advantages of the Batch Spray System ■ Comparison with Other Systems ■ Conclusion *For more details, please download the PDF or feel free to contact us.